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Interesting. Curious what the yield is. And he doesn't need a cleanroom, or work with dangerous chemicals like HF?
He mentions HF around 4:05 but by that time I have long lost my understanding of whats going on so this may not be what you mean.
He uses 1% HF, which is fairly managable.
I don't think you need a cleanroom if your feature sizes are huge.
Making the masks in photoshop is a really neat trick. Reminds me of Bob Moore of Forth fame who said something like "once you have enough code to draw a square you are half way to a chip design package".
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I loved this, it made me realise how close to negative development is to photolithography. When doing separate etching layers how are wafers lined up or is everything done in situ?