Can Substrate disrupt ASML using particle acceleration? (nytimes.com)

It claims that they can print 12nm features with their particle accelerator. This looks weird.

I don’t have a times subscription but this looks to be Xray lithography using a synchrotron to produce the X-rays? Can anyone confirm?

I hope this is not the case but a charismatic, politically connected college dropout in the past promised to revolutionize a multi billion dollar industry and ended up going to jail for fraud (Elizabeth Holmes).

We need to see their detailed implementation strategy to understand whether this can ever be viable. If it is, you can be sure that ASML is already working on it.

For those who don't know, ASML didn't invent EUV lithography. It was invented in the US, paid for largely by the US government, and licensed to ASML for commercialization.

https://en.wikipedia.org/w/index.php?title=ASML_Holding&sect...

If anything, the most complicated problem in lithography is not EUV at all. The hardest problem is the overlay mismatch. ASML had spent decades minimizing overlay mismatch. A new player in semiconductor may claim to master EUV, or X-Ray or contact printing, but everyone must solve the overlay mismatch problem. That is no more easier than the EUV part.